Search

Freda S Nunn

Examiner (ID: 13274, Phone: (571)272-2607 , Office: P/2916 )

Most Active Art Unit
2911
Art Unit(s)
2901, 2916, 2911, 2899
Total Applications
8991
Issued Applications
8887
Pending Applications
0
Abandoned Applications
103

Applications

Application numberTitle of the applicationFiling DateStatus
Array ( [id] => 946508 [patent_doc_number] => 06964840 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-11-15 [patent_title] => 'Radiation-sensitive resin composition' [patent_app_type] => utility [patent_app_number] => 10/867892 [patent_app_country] => US [patent_app_date] => 2004-06-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 23705 [patent_no_of_claims] => 6 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 23 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/964/06964840.pdf [firstpage_image] =>[orig_patent_app_number] => 10867892 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/867892
Radiation-sensitive resin composition Jun 15, 2004 Issued
Array ( [id] => 948732 [patent_doc_number] => 06962768 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-11-08 [patent_title] => 'Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same' [patent_app_type] => utility [patent_app_number] => 10/799025 [patent_app_country] => US [patent_app_date] => 2004-03-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 14205 [patent_no_of_claims] => 67 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 29 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/962/06962768.pdf [firstpage_image] =>[orig_patent_app_number] => 10799025 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/799025
Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same Mar 11, 2004 Issued
Array ( [id] => 941187 [patent_doc_number] => 06969577 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-11-29 [patent_title] => 'Positive resist composition' [patent_app_type] => utility [patent_app_number] => 10/792306 [patent_app_country] => US [patent_app_date] => 2004-03-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 12153 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 125 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/969/06969577.pdf [firstpage_image] =>[orig_patent_app_number] => 10792306 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/792306
Positive resist composition Mar 3, 2004 Issued
Array ( [id] => 7677816 [patent_doc_number] => 20040152010 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-08-05 [patent_title] => 'Imagable articles and compositions, and their use' [patent_app_type] => new [patent_app_number] => 10/694205 [patent_app_country] => US [patent_app_date] => 2003-10-27 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 8223 [patent_no_of_claims] => 36 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 40 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0152/20040152010.pdf [firstpage_image] =>[orig_patent_app_number] => 10694205 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/694205
Imagable articles and compositions, and their use Oct 26, 2003 Abandoned
Array ( [id] => 7470214 [patent_doc_number] => 20040096772 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-05-20 [patent_title] => 'Novel copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio' [patent_app_type] => new [patent_app_number] => 10/685432 [patent_app_country] => US [patent_app_date] => 2003-10-16 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 2 [patent_no_of_words] => 6055 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 55 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0096/20040096772.pdf [firstpage_image] =>[orig_patent_app_number] => 10685432 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/685432
Copolymer, photoresist composition, and process for forming resist pattern with high aspect ratio Oct 15, 2003 Issued
Array ( [id] => 7165863 [patent_doc_number] => 20040076905 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-04-22 [patent_title] => 'Onium salts and positive resist materials using the same' [patent_app_type] => new [patent_app_number] => 10/683107 [patent_app_country] => US [patent_app_date] => 2003-10-10 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6587 [patent_no_of_claims] => 12 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 50 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0076/20040076905.pdf [firstpage_image] =>[orig_patent_app_number] => 10683107 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/683107
Onium salts and positive resist materials using the same Oct 9, 2003 Issued
Array ( [id] => 7677817 [patent_doc_number] => 20040152009 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-08-05 [patent_title] => 'Sulfonate and resist composition' [patent_app_type] => new [patent_app_number] => 10/646710 [patent_app_country] => US [patent_app_date] => 2003-08-25 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10435 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 7 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0152/20040152009.pdf [firstpage_image] =>[orig_patent_app_number] => 10646710 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/646710
Sulfonate and resist composition Aug 24, 2003 Issued
Array ( [id] => 7134233 [patent_doc_number] => 20040043324 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-03-04 [patent_title] => 'Resin useful for resist, resist composition and pattern forming process using the same' [patent_app_type] => new [patent_app_number] => 10/635571 [patent_app_country] => US [patent_app_date] => 2003-08-07 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 6 [patent_figures_cnt] => 6 [patent_no_of_words] => 27458 [patent_no_of_claims] => 29 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 32 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0043/20040043324.pdf [firstpage_image] =>[orig_patent_app_number] => 10635571 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/635571
Resin useful for resist, resist composition and pattern forming process using the same Aug 6, 2003 Issued
Array ( [id] => 7357394 [patent_doc_number] => 20040013978 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2004-01-22 [patent_title] => 'Pattern formation material and pattern formation method' [patent_app_type] => new [patent_app_number] => 10/610912 [patent_app_country] => US [patent_app_date] => 2003-07-02 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 3 [patent_figures_cnt] => 3 [patent_no_of_words] => 1997 [patent_no_of_claims] => 4 [patent_no_of_ind_claims] => 2 [patent_words_short_claim] => 95 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0013/20040013978.pdf [firstpage_image] =>[orig_patent_app_number] => 10610912 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/610912
Pattern formation material and pattern formation method Jul 1, 2003 Issued
Array ( [id] => 1005218 [patent_doc_number] => 06905810 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-06-14 [patent_title] => 'Permanent resist, permanent resist-laminated substrate and process for producing the same' [patent_app_type] => utility [patent_app_number] => 10/455375 [patent_app_country] => US [patent_app_date] => 2003-06-06 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5931 [patent_no_of_claims] => 13 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 59 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/905/06905810.pdf [firstpage_image] =>[orig_patent_app_number] => 10455375 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/455375
Permanent resist, permanent resist-laminated substrate and process for producing the same Jun 5, 2003 Issued
Array ( [id] => 1085526 [patent_doc_number] => 06830870 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-12-14 [patent_title] => 'Acetal protected polymers and photoresists compositions thereof' [patent_app_type] => B2 [patent_app_number] => 10/446540 [patent_app_country] => US [patent_app_date] => 2003-05-28 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6171 [patent_no_of_claims] => 42 [patent_no_of_ind_claims] => 11 [patent_words_short_claim] => 260 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/830/06830870.pdf [firstpage_image] =>[orig_patent_app_number] => 10446540 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/446540
Acetal protected polymers and photoresists compositions thereof May 27, 2003 Issued
Array ( [id] => 1104375 [patent_doc_number] => 06811960 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-11-02 [patent_title] => 'Partially crosslinked polymer for bilayer photoresist' [patent_app_type] => B2 [patent_app_number] => 10/436742 [patent_app_country] => US [patent_app_date] => 2003-05-12 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 4 [patent_figures_cnt] => 4 [patent_no_of_words] => 4111 [patent_no_of_claims] => 16 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 88 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/811/06811960.pdf [firstpage_image] =>[orig_patent_app_number] => 10436742 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/436742
Partially crosslinked polymer for bilayer photoresist May 11, 2003 Issued
Array ( [id] => 6825159 [patent_doc_number] => 20030235781 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-12-25 [patent_title] => 'High molecular compound, monomer compounds and photosensitive composition for photoresist, pattern forming method utilizing photosensitive composition, and method of manufacturing electronic components' [patent_app_type] => new [patent_app_number] => 10/425848 [patent_app_country] => US [patent_app_date] => 2003-04-30 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 5 [patent_figures_cnt] => 5 [patent_no_of_words] => 58607 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 9 [patent_words_short_claim] => 28 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0235/20030235781.pdf [firstpage_image] =>[orig_patent_app_number] => 10425848 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/425848
HIGH MOLECULAR COMPOUND, MONOMER COMPOUNDS AND PHOTOSENSITIVE COMPOSITION FOR PHOTORESIST, PATTERN FORMING METHOD UTILIZING PHOTOSENSITIVE COMPOSITION, AND METHOD OF MANUFACTURING ELECTRONIC COMPONENTS Apr 29, 2003 Issued
Array ( [id] => 1125948 [patent_doc_number] => 06790591 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2004-09-14 [patent_title] => 'Polymers, resist compositions and patterning process' [patent_app_type] => B2 [patent_app_number] => 10/406278 [patent_app_country] => US [patent_app_date] => 2003-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 9694 [patent_no_of_claims] => 8 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 129 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/790/06790591.pdf [firstpage_image] =>[orig_patent_app_number] => 10406278 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/406278
Polymers, resist compositions and patterning process Apr 3, 2003 Issued
Array ( [id] => 1043550 [patent_doc_number] => 06866983 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2005-03-15 [patent_title] => 'Resist compositions and patterning process' [patent_app_type] => utility [patent_app_number] => 10/406222 [patent_app_country] => US [patent_app_date] => 2003-04-04 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 10297 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 20 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/06/866/06866983.pdf [firstpage_image] =>[orig_patent_app_number] => 10406222 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/406222
Resist compositions and patterning process Apr 3, 2003 Issued
Array ( [id] => 657812 [patent_doc_number] => 07105271 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-09-12 [patent_title] => 'Negative resist composition comprising hydroxy-substituted base polymer and si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same' [patent_app_type] => utility [patent_app_number] => 10/400097 [patent_app_country] => US [patent_app_date] => 2003-03-26 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 2 [patent_figures_cnt] => 4 [patent_no_of_words] => 2949 [patent_no_of_claims] => 15 [patent_no_of_ind_claims] => 5 [patent_words_short_claim] => 35 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/105/07105271.pdf [firstpage_image] =>[orig_patent_app_number] => 10400097 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/400097
Negative resist composition comprising hydroxy-substituted base polymer and si-containing crosslinker having epoxy ring and a method for patterning semiconductor devices using the same Mar 25, 2003 Issued
Array ( [id] => 6808952 [patent_doc_number] => 20030198891 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-10-23 [patent_title] => 'Novel ester compounds polymers, resist compositions and patterning process' [patent_app_type] => new [patent_app_number] => 10/390795 [patent_app_country] => US [patent_app_date] => 2003-03-19 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 1 [patent_figures_cnt] => 1 [patent_no_of_words] => 14058 [patent_no_of_claims] => 7 [patent_no_of_ind_claims] => 3 [patent_words_short_claim] => 10 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0198/20030198891.pdf [firstpage_image] =>[orig_patent_app_number] => 10390795 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/390795
Novel ester compounds polymers, resist compositions and patterning process Mar 18, 2003 Abandoned
Array ( [id] => 6842879 [patent_doc_number] => 20030148226 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-08-07 [patent_title] => 'Optical waveguide forming material and method' [patent_app_type] => new [patent_app_number] => 10/358187 [patent_app_country] => US [patent_app_date] => 2003-02-05 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5450 [patent_no_of_claims] => 3 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 136 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0148/20030148226.pdf [firstpage_image] =>[orig_patent_app_number] => 10358187 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/358187
Optical waveguide forming material and method Feb 4, 2003 Abandoned
Array ( [id] => 6829601 [patent_doc_number] => 20030180659 [patent_country] => US [patent_kind] => A1 [patent_issue_date] => 2003-09-25 [patent_title] => 'Resist composition' [patent_app_type] => new [patent_app_number] => 10/350005 [patent_app_country] => US [patent_app_date] => 2003-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 5606 [patent_no_of_claims] => 9 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 18 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => publication [pdf_file] => publications/A1/0180/20030180659.pdf [firstpage_image] =>[orig_patent_app_number] => 10350005 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/350005
Resist composition Jan 23, 2003 Abandoned
Array ( [id] => 723802 [patent_doc_number] => 07045267 [patent_country] => US [patent_kind] => B2 [patent_issue_date] => 2006-05-16 [patent_title] => 'Resist composition comprising photosensitive polymer having lactone in its backbone' [patent_app_type] => utility [patent_app_number] => 10/349917 [patent_app_country] => US [patent_app_date] => 2003-01-24 [patent_effective_date] => 0000-00-00 [patent_drawing_sheets_cnt] => 0 [patent_figures_cnt] => 0 [patent_no_of_words] => 6008 [patent_no_of_claims] => 24 [patent_no_of_ind_claims] => 1 [patent_words_short_claim] => 21 [patent_maintenance] => 1 [patent_no_of_assignments] => 0 [patent_current_assignee] =>[type] => patent [pdf_file] => patents/07/045/07045267.pdf [firstpage_image] =>[orig_patent_app_number] => 10349917 [rel_patent_id] =>[rel_patent_doc_number] =>)
10/349917
Resist composition comprising photosensitive polymer having lactone in its backbone Jan 23, 2003 Issued
Menu