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Patent 07811421 - High deposition rate sputtering > Summary

US Patent

Patent No. US 07811421

Published on Oct 12, 2010

Application No. 11/183463

Filed on Jul 18, 2005

Priority Date -

Inventor/Applicants

Chistyakov, Roman - Andover, MA US

Classification

International:

C23C 14/35

National:3

204/192.12

204/298.8;

204/298.6;

Field of Search 3

204/192.12

204/298.6;

204/298.8;

Examiner

McDonald, Rodney G

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