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Patent No. US 09499721
Issue Date Nov 22, 2016
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Patent 09499721 - Colloidal silica chemical-mechanical polishing composition > Summary

US Patent

Patent No. US 09499721

Published on Nov 22, 2016

Application No. 14/749948

Filed on Jun 25, 2015

Priority Date -

Inventor/Applicants

4

Grumbine, Steven - Aurora, IL US

Dysard, Jeffrey - St. Charles, IL US

Shen, Ernest - Naperville, IL US

Cavanaugh, Mary - Naperville, IL US

Classification

International:9

B44C 1/22

C09G 1/02;

B24B 1/00;

C09G 1/00;

C09G 1/04;

C09K 3/14;

H01L 21/306;

H01L 21/321;

H01L 21/3105;

Field of Search 4

216/37

216/53;

216/67;

438/689-691;

Examiner

2

Deo, Duy

Angadi, Maki

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