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Patexia Research
Patent No. US 11278734
Issue Date Mar 22, 2022
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Patent 11278734 - Systems and methods for nail treatment > Claims

  • 1. A method for affecting a growth rate of a nail of a digit of a subject, comprising: detecting, using a presence detector, a presence of the nail or the digit;irradiating, using a narrowband light source, the nail over a treatment time using a light;controlling, using a controller, at least one of (a) a power of the light or (b) the treatment time to irradiate the nail with a dosage of the light that is within a biphasic light dosage range, wherein a wavelength of the light and the dosage of the light are (i) configured to affect a growth rate of the nail, and (ii) provided in a range of 502 nm-980 nm; andrecording, using the controller, at least one parameter related to the dosage of the light as electronic information.
    • 2. The method of claim 1, wherein the wavelength of the light is at least one of 658 nm, 665 nm, 765 nm, 850 nm, or 855 nm.
      • 3. The method of claim 2, wherein the biphasic light dosage range is bounded by (a) a lesser light dosage which is about 0.5 J/cm2, and (b) a greater light dosage that is about 100 J/cm2.
        • 4. The method of claim 3, wherein the treatment time is between 60 seconds and 14400 seconds.
    • 5. The method of claim 1, further comprising: estimating or determining a treatment irradiance for the nail based on (a) the presence of the nail or the digit at a known location, and (b) a power of the light; andcontrolling the dosage of the light based on the treatment irradiance.
    • 6. The method of claim 1, further comprising: measuring, using a photodetector, a treatment irradiance for the nail; andcontrolling the dosage of the light based on the treatment irradiance.
    • 7. The method of claim 1, wherein the narrowband light source comprises at least one of a light emitting diode, a light emitting capacitor, a laser, a flash lamp, or a filtered wideband light source.
    • 8. The method of claim 1, wherein the method is configured to increase the growth rate of the nail or decrease the growth rate of the nail.
    • 9. The method of claim 1, wherein the at least one parameter related to the dosage of the light comprises at least one of a start time of treatment, an end time of treatment, the power of the light, the treatment time of the light, or the dosage of the light.
      • 10. The method of claim 9, further comprising verifying the dosage of the light for compliance using the electronic information.
    • 11. The method of claim 1, further comprising controlling, using the controller, the dosage of the light based upon a dosing schedule.
    • 12. The method of claim 1, wherein the presence detector comprises at least one of a pressure sensor, a camera, a time of flight (TOF) system, a LiDAR system, a capacitive proximity sensor, a photoelectric sensor, an optical sensor, an infrared sensors, or a switch.
    • 13. The method of claim 1, wherein the wavelength of the light and the dosage of the light is provided in a range of 600 nm-850 nm.
    • 14. The method of claim 1, further comprising: irradiating, using a further narrowband light source, the nail over using a further light; andcontrolling, using the controller, at least one of (a) a power of the further light or (b) the treatment time to irradiate the nail with a further dosage of the further light.
      • 15. The method of claim 14, wherein a further wavelength of the further light and a further dosage of the further light are provided in a range of 700 nm-2000 nm.
      • 16. The method of claim 14, wherein a further wavelength of the further light and a further dosage of the further light are provided in a range of 700 nm-2000 nm.
  • 17. A system for affecting a growth rate of a nail of a digit of a subject, the system comprising: a presence detector configured to detect a presence of the nail or the digit;a narrowband light source configured to irradiate the nail over a treatment time using a light; anda controller configured to control at least one of (a) a power of the light or (b) the treatment time to irradiate the nail with a dosage of the light that is within a biphasic light dosage range, wherein a wavelength of the light and the dosage of the light are (ii) configured to affect a growth rate of the nail and (ii) provided in a range of 502 nm-980 nm, and wherein the controller is configured to record at least one parameter related to the dosage of the light as electronic information.
    • 18. The system of claim 17, wherein the wavelength of the light is at least one of 658 nm, 665 nm, 765 nm, 850 nm, or 855 nm.
      • 19. The system of claim 18, wherein the biphasic light dosage range is bounded by (a) a lesser light dosage which is about 0.5 J/cm2, and (b) a greater light dosage that is about 100 J/cm2.
        • 20. The system of claim 19, wherein the treatment time is between 60 seconds and 14400 seconds.
      • 21. The system of claim 18, wherein the at least one parameter related to the dosage of the light comprises at least one of a start time of treatment, an end time of treatment, the power of the light, the treatment time of the light, or the dosage of the light.
        • 22. The system of claim 21, wherein the controller is configured to verify the dosage of the light for compliance using the electronic information.
    • 23. The system of claim 17, wherein the controller is configured to: estimate or determining a treatment irradiance for the nail based on (a) the presence of the nail or the digit at a known location, and (b) a power of the light; andcontrol the dosage of the light based on the treatment irradiance.
    • 24. The system of claim 17, comprising: a photodetector configured to measure a treatment irradiance for the nail; andwherein the controller is configured to control the dosage of the light based on the treatment irradiance.
    • 25. The system of claim 17, wherein the narrowband light source comprises at least one of a light emitting diode, a light emitting capacitor, a laser, a flash lamp, or a filtered wideband light source.
    • 26. The system of claim 17, wherein the system is configured to increase the growth rate of the nail or decrease the growth rate of the nail.
    • 27. The system of claim 17, wherein the controller is configured to control the dosage of the light based on a dosing schedule.
    • 28. The system of claim 17, wherein the presence detector comprises at least one of a pressure sensor, a camera, a time of flight (TOF) system, a LiDAR system, a capacitive proximity sensor, a photoelectric sensor, an optical sensor, an infrared sensors, or a switch.
    • 29. The system of claim 17, wherein the wavelength of the light and the dosage of the light is provided in a range of 600 nm-850 nm.
    • 30. The system of claim 17, further comprising: a further narrowband light source irradiating the nail over using a further light, wherein the controller is further configured to control at least one of (a) a power of the further light or (b) the treatment time to irradiate the nail with a further dosage of the further light.
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