Projection objective and projection exposure apparatus for microlithography | Patent Number 08441613

US 08441613 B2
Application Number13050346
Publication NumberUS 20110164235 A1
Pendency2 years, 1 month, 29 days
Filled DateMar 17, 2011
Priority DateJun 1, 2007
Publication DateJul 7, 2011
Expiration DateMay 31, 2027
Inventor/ApplicantsRalf Mueller
ExaminesRIDDLE, CHRISTINA A
Art Unit2882
Technology Center2800
Assignments
Carl Zeiss Smt Gmbh
Current
Carl Zeiss Smt GmbhCarlzeissstiftung
Original
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