Projection objective for a microlithographic projection exposure apparatus | Patent Number 09280058
US 09280058 B2Filled DateOct 6, 2014
Priority DateJun 10, 2004
Publication DateFeb 26, 2015
Expiration DateJun 10, 2024
Inventor/ApplicantsRobert Eder
Norbert Wabra
Norbert Wabra
ExaminesKREUTZER, COLIN WRIGHT
Art Unit2882
Technology Center2800
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