Methods of forming finfet devices with a shared gate structure | Patent Publication Number 20140273429

US 20140273429 A1

Patent NumberUS 08936986 B2

Application Number13797117

Filled DateMar 12, 2013

Priority DateMar 12, 2013

Publication DateSep 18, 2014

Original AssigneeGlobalfoundries

Current AssigneeGlobalfoundries

Inventor/ApplicantsDae Geun Yang
Andy C. Wei

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