Colloidal silica chemical-mechanical polishing composition | Patent Publication Number 20150376459

US 20150376459 A1

Patent NumberUS 09499721 B2

Application Number14749948

Filled DateJun 25, 2015

Priority DateJun 25, 2014

Publication DateDec 31, 2015

Original AssigneeEntegris

Current AssigneeCmc Materials

Inventor/ApplicantsJeffrey Dysard
Ernest Shen
Mary Cavanaugh
Steven Grumbine

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