Semiconductor formation method that utilizes multiple etch stop layers | Patent Application Number 10934828

10934828
Not Appealed
Patent NumberUS 07572727 B1
Publication Number-
Filled DateSep 2, 2004
Priority DateSep 2, 2004
Inventor/ApplicantsKouros Ghandehari
Wenmei Li
Angela T. Hui
Dawn Hopper
ExaminesSMOOT, STEPHEN W
Art Unit2813
Technology Center2800
Assignments
Morgan Stanley Senior Funding Inc.
Current
Spansion Llc
Original
Law Firm
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