Semiconductor formation method that utilizes multiple etch stop layers | Patent Number 07572727

US 07572727 B1
Application Number10934828
Publication Number-
Pendency4 years, 11 months, 14 days
Filled DateSep 2, 2004
Priority DateSep 2, 2004
Publication Date-
Expiration DateSep 2, 2024
Inventor/ApplicantsKouros Ghandehari
Dawn Hopper
Angela T. Hui
Wenmei Li
ExaminesSMOOT, STEPHEN W
Art Unit2813
Technology Center2800
Assignments
Morgan Stanley Senior Funding Inc.
Current
Spansion Llc
Original
Law Firm
You must be logged in to view
Login
Attorneys
Subscription-Only
View Concierge Program
Patent Prosecution report image

Empower your practice with Patexia Publication Prosecution IP Module.

Get access to our exclusive rankings and unlock powerful data.
Check our Latest ReportPurchase IP Module

Looking for a Publication Attorney?

Get in touch with our team or create your account to start exploring a network of over 120K attorneys.