Method of forming a high quality gate oxide layer having a uniform thickness | Patent Application Number 9689030

9689030
Not Appealed
Patent NumberUS 06544907 B1
Publication Number-
Filled DateOct 12, 2000
Priority DateOct 12, 2000
Inventor/ApplicantsYi Ma
Edith Yang
ExaminesEVERHART, CARIDAD
Art Unit2825
Technology Center2800
Assignments
Bell Semiconductor Llc
Current
Bellnorthern Research
Current
Hilco Patent Acquisition 55 Llc
Current
Agere Systems BroadcomBroadcom
Original
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