Method of forming a high quality gate oxide layer having a uniform thickness | Patent Number 06544907

US 06544907 B1
Application Number9689030
Publication Number-
Pendency2 years, 5 months, 28 days
Filled DateOct 12, 2000
Priority DateOct 12, 2000
Publication Date-
Expiration DateOct 12, 2020
Inventor/ApplicantsYi Ma
Edith Yang
ExaminesEVERHART, CARIDAD
Art Unit2825
Technology Center2800
Assignments
Bellnorthern Research
Current
Hilco Patent Acquisition 55 Llc
Current
Bell Semiconductor Llc
Current
Agere Systems BroadcomBroadcom
Original
Law Firm
You must be logged in to view
Login
Attorneys
Subscription-Only
View Concierge Program
Patent Prosecution report image

Empower your practice with Patexia Publication Prosecution IP Module.

Get access to our exclusive rankings and unlock powerful data.
Check our Latest ReportPurchase IP Module

Looking for a Publication Attorney?

Get in touch with our team or create your account to start exploring a network of over 120K attorneys.