High-density plasma source using excited atoms | Patent Number 06806652

US 06806652 B1

Application Number10249844

Publication NumberUS 20040212312 A1

Pendency1 year, 5 months, 11 days

Filled DateMay 12, 2003

Priority DateApr 22, 2003

Publication DateOct 28, 2004

Expiration DateOct 19, 2016

Inventor/ApplicantsRoman Chistyakov
Roman Chistyakov

ExaminesALEMU, EPHREM

Art Unit2821

Technology Center2800

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