Semiconductor device and method for high-k gate dielectrics | Patent Number 07355235

US 07355235 B2
Application Number11020377
Publication NumberUS 20060131675 A1
Pendency3 years, 3 months, 18 days
Filled DateDec 22, 2004
Priority DateDec 22, 2004
Publication DateJun 22, 2006
Expiration DateDec 22, 2024
Inventor/ApplicantsShang-Chih Chen
Ching-Wei Tsai
Chih-Hao Wang
ExaminesBRYANT, KIESHA ROSE
Art Unit2822
Technology Center2800
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
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