System and method for photolithography in semiconductor manufacturing | Patent Number 07501227

US 07501227 B2
Application Number11216658
Publication NumberUS 20070048678 A1
Pendency3 years, 6 months, 12 days
Filled DateAug 31, 2005
Priority DateAug 31, 2005
Publication DateMar 1, 2007
Expiration DateAug 30, 2025
Inventor/ApplicantsChin-Hsiang Lin
Kuei Shun Chen
David Ding-Chung Lu
ExaminesDUDA, KATHLEEN
Art Unit1795
Technology Center1700
Assignments
Taiwan Semiconductor Manufacturing Company
Current
Taiwan Semiconductor Manufacturing Company
Original
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