System and method for photolithography in semiconductor manufacturing | Patent Publication Number 20070048678

US 20070048678 A1

Patent NumberUS 07501227 B2

Application Number11216658

Filled DateAug 31, 2005

Priority DateAug 31, 2005

Publication DateMar 1, 2007

Original AssigneeTaiwan Semiconductor Manufacturing Company

Current AssigneeTaiwan Semiconductor Manufacturing Company

Inventor/ApplicantsChin-Hsiang Lin
Kuei Shun Chen
David Ding-Chung Lu

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