Projection objective and projection exposure apparatus for microlithography | Patent Number 07929115

US 07929115 B2
Application Number12129161
Publication NumberUS 20080297884 A1
Pendency2 years, 10 months, 25 days
Filled DateMay 29, 2008
Priority DateJun 1, 2007
Publication DateDec 4, 2008
Expiration DateMay 31, 2027
Inventor/ApplicantsRalf Mueller
ExaminesRIDDLE, CHRISTINA A
Art Unit2882
Technology Center2800
Assignments
Carl Zeiss Smt Gmbh
Current
Carl Zeiss Smt GmbhCarlzeissstiftung
Original
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