Projection objective and projection exposure apparatus for microlithography | Patent Publication Number 20080297884
US 20080297884 A1Patent NumberUS 07929115 B2
Application Number12129161
Filled DateMay 29, 2008
Priority DateJun 1, 2007
Publication DateDec 4, 2008
Original AssigneeCarlzeissstiftung
Current AssigneeCarl Zeiss Smt Gmbh
Inventor/ApplicantsRalf Mueller
Empower your practice with Patexia Publication Prosecution IP Module.
Get access to our exclusive rankings and unlock powerful data.
Looking for a Publication Attorney?
Get in touch with our team or create your account to start exploring a
network of over 120K attorneys.