Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Patent Number 08334016

US 08334016 B2
Application Number12407556
Publication NumberUS 20120028478 A1
Pendency3 years, 9 months, 5 days
Filled DateMar 19, 2009
Priority DateSep 28, 2000
Publication DateFeb 2, 2012
Expiration DateSep 28, 2020
Inventor/ApplicantsSeigi Suh
Roy G. Gordon
Dennis Hausmann
Jill S. Becker
Jill Becker
ExaminesCHEN, BRET P
Art Unit1715
Technology Center1700
Assignments
Harvard College
Current
Harvard College
Original
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