Vapor deposition of metal oxides, silicates and phosphates, and silicon dioxide | Patent Publication Number 20040043149

US 20040043149 A1
Patent NumberUS 06969539 B2
Application Number10381628
Filled DateSep 28, 2001
Priority DateSep 28, 2000
Publication DateMar 4, 2004
Original AssigneeHarvard College
Current AssigneeHarvard College
Inventor/ApplicantsJill Becker
Dennis Hausmann
Dennis Hausmann
Jill Becker
Seigi Suh
Roy G. Gordon
Roy G. Gordon
Seigi Suh
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