High deposition rate sputtering | Patent Application Number 10065739

10065739
Not Appealed
Patent NumberUS 06896773 B2
Publication NumberUS 20040094411 A1
Filled DateNov 14, 2002
Priority DateNov 14, 2002
Inventor/ApplicantsRoman Chistyakov
Roman Chistyakov
ExaminesMCDONALD, RODNEY GLENN
Art Unit1753
Technology Center1700
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