High deposition rate sputtering | Patent Application Number 11183463
11183463
Not Appealed
Patent NumberUS 07811421 B2
Publication NumberUS 20050252763 A1
Filled DateJul 18, 2005
Priority DateMar 28, 2005
Inventor/ApplicantsRoman Chistyakov
ExaminesMCDONALD, RODNEY GLENN
Art Unit1795
Technology Center1700
Assignments
Law Firm
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