High deposition rate sputtering | Patent Publication Number 20050252763

US 20050252763 A1

Patent NumberUS 07811421 B2

Application Number11183463

Filled DateJul 18, 2005

Priority DateMar 28, 2005

Publication DateNov 17, 2005

Original AssigneeZond

Current AssigneeZond

Inventor/ApplicantsRoman Chistyakov

Patent Prosecution report image

Empower your practice with Patexia Publication Prosecution IP Module.

Get access to our exclusive rankings and unlock powerful data.

Check our Latest Report Purchase IP Module

Looking for a Publication Attorney?

Get in touch with our team or create your account to start exploring a network of over 120K attorneys.