Method for protecting a gate structure during contact formation | Patent Publication Number 20130299921

US 20130299921 A1
Patent NumberUS 08648446 B2
Application Number13944335
Filled DateJul 17, 2013
Priority DateApr 22, 2009
Publication DateNov 14, 2013
Original AssigneeTaiwan Semiconductor Manufacturing Company
Current AssigneeTaiwan Semiconductor Manufacturing Company
Inventor/ApplicantsHong-Dyi Chang
Kong-Beng Thei
Harry Hak-Lay Chuang
Hun-Jan Tao
Pei-Chao Su
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